Vertical 3D gallium nitride field-effect transistors based on fin structures with inverted p-doped channel
نویسندگان
چکیده
منابع مشابه
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Although the demand for high-speed telecommunications has increased in recent years, the performance of transistors fabricated with traditional semiconductors such as silicon, gallium arsenide, and gallium nitride have reached their physical performance limits. Therefore, new materials with high carrier velocities should be sought for the fabrication of next-generation, ultra-high-speed transis...
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ژورنال
عنوان ژورنال: Semiconductor Science and Technology
سال: 2020
ISSN: 0268-1242,1361-6641
DOI: 10.1088/1361-6641/abc5ff